DSpace
 

S.N.Bose National Centre for Basic Sciences >
Library >
Publications >
2018 >

Please use this identifier to cite or link to this item: http://hdl.handle.net/123456789/2038

Title: Tunable growth of semiconductor nanostructures by Plasma Enhanced Chemical Vapor Deposition - Synthesis, morphological and Raman studies
Authors: Leela, S
Rohini, G V
Saranya, K
Bhattacharya, Sekhar
Ahmed, Nafis
Sett, Shaili
Ghosh, Barnali
Keywords: SiNW
Electron beam method
Semiconductor
CVD
Raman spectroscopy
Issue Date: 2018
Publisher: Superlattices and Microstructures
Citation: S. Leela, GV. Rohini, K. Saranya, Sekhar Bhattacharya, Nafis Ahmed, Shaili Sett, and Barnali Ghosh, Tunable growth of semiconductor nanostructures by Plasma Enhanced Chemical Vapor Deposition - Synthesis, morphological and Raman studies, Superlattices and Microstructures, 122, 510–515, 2018
URI: http://hdl.handle.net/123456789/2038
Appears in Collections:2018

Files in This Item:

File Description SizeFormat
Tunable growth of semiconductor nanostructures.pdf2.52 MBAdobe PDFView/Open

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

 

Valid XHTML 1.0! DSpace Software Copyright © 2002-2010  Duraspace - Feedback